ALD
Atomic Layer Deposition
ALD, or atomic layer deposition, grows thin films by sequentially repeating self-saturating surface reactions.
Other learning contexts (2)
In context
Precursors are supplied sequentially, and remaining gases are removed between reactions. It uses the property that, once the surface has reacted sufficiently, additional supply in that step produces only limited additional growth.
Example
Despite the name, a cycle does not always complete exactly one atomic layer. Actual growth per cycle varies with material, surface, and reaction conditions.
Key distinction
The essence of ALD is a self-limiting surface reaction, rather than the atom count implied by its name.
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