PEB
Post-exposure bake
PEB is a heating step after exposure used to advance or stabilize photoresist reactions.
Other learning contexts (1)
In context
In chemically amplified resists, acid generated by exposure assists reactions. Heating conditions affect reaction extent and final dimensions, so they are controlled separately from exposure dose.
Example
Unlike soft bake, which reduces solvent after coating, PEB addresses reactions after exposure. Not every resist uses the same PEB principles and conditions.
Key distinction
Distinguish heating steps by their position in the process and the chemical changes occurring at that point.
Explore this field
View map ↗22 planned packsView packs ↗
L0 OverviewL1 FoundationsL2 Advanced
